SPIE is happy to announce that the industry supports student participation by presenting awards for best student papers, including oral or poster, sponsored by:
Read on to learn more about the awards.
In addition to the annual scholarship, BACUS hosts several awards at this event.
| Award | Description |
| BACUS Prize | To recognize outstanding contributions to the photomask industry that have at least one of the following attributes: a fundamental change or innovation, an enduring contribution, and/or an enabling contribution |
| Lifetime Achievement Award | To recognize an individual who, during their lifetimes, have made distinct contributions of outstanding business or technical significance to the photomask industry |
| Best Oral Technical Presentation Award | To recognize an outstanding oral presentation and research, this recognition is awarded at the chairs’ discretion, typically by committee vote. Presentations will be judged on three criteria: technical impact, scientific analysis, and delivery/presentation. |
| Best Poster Presentation Award | To recognize an outstanding poster presentation and research, recognition is awarded at the chairs’ discretion, typically by committee vote. |
BACUS is an international professional organization of mask makers, equipment suppliers, and mask users – functioning as a Technical Group of SPIE.
Established to encourage students working in fields related to photomasks and EUV lithography.
The first place winner receives $1,500. The second place winner receives $1,000.
Award sponsor:
Eligibility and application
To be considered the student must:
Selection
The SPIE Photomask + EUV Lithography symposium student papers and posters will be assessed and awarded by an independent jury consisting of members of the program committee from both conferences. Contributions will be judged for technical merit, relevance of the topic to the industry, and the author’s ability to explain the work.
The EUV Tech Award was established to support students working in the fields of EUV lithography and photomasks.
| Award | First author | Paper |
| EUV Tech Best Student Presentation 1st | Yu-Jin Chae | Pixelated source polarization optimization for hyper-NA EUV lithography [13686-51] |
| EUV Tech Best Student Presentation 2nd | Vishal Singh | The effect of the resist formulation on the dissolution behavior of EUV photoresists [13686-112] |
Established to encourage students working in fields related to photomasks. Finalists were selected from mask-related student oral papers.
| Award | First author | Paper |
| Photronics Student Award 1st | Shilong Zhang | Integrated curvilinear OPC and SRAF optimization through reinforcement learning [13687-61] |
| Photronics Student Award 2nd | Jean Chien | Stochastic-aware hotspot detection with cycleGAN-augmented SEM data and uncertainty quantification for process control applications [13686-56] |
Dong Gi Lee, Hanyang University (Republic of Korea), was awarded the BACUS Scholarship. This scholarship is awarded to a student in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies. This scholarship is sponsored by BACUS, SPIE's Photomask International Technical Group.
The 2023 application for the $5,000 BACUS scholarship is now closed. We look forward to announcing the 2023 recipient at this year's event.
See scholarship details and read more about this year's recipient
BACUS is an international professional organization of mask makers, equipment suppliers, and mask users – functioning as a Technical Group of SPIE.
Learn about student opportunities, including scholarships to help cover the cost of registration, travel, and lodging to attend the conference.
