8 - 11 September 2026
Monterey, California, US

Attend SPIE Photomask Technology + EUVL

Join the global meeting for mask makers, EUVL, emerging technologies, and the future of mask business

Join your technical community

Come to Monterey, California for the technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Event venue

Monterey Conference Center
1 Portola Plaza
Monterey, CA 93940

Register today

Why attend SPIE Photomask Technology + EUV Lithography?


Attendee of Photomask Technology + EUV Lithography

See the latest research

Experts sharing the latest breakthroughs from around the globe

Two male colleagues connect and greet each other

Connect with colleagues

Technical and networking events to help you make important contacts

Speaker at Photomask Technology + EUV Lithography

World-class speakers

Leaders in the field sharing their research and vision of the future

An opportunity to engage with leading companies at the exhibition


Learn more about the free exhibition

Companies offer an inside look into their portfolio of products and services, and connections are made in one-on-one conversations with company representatives.

Get familiar with the free SPIE conference app

See for yourself all the things the app can do to enhance your conference experience. Watch the tutorial and learn how to:
  • Browse and search the program to find talks and special events
  • Find people in the program and see if they are attending or presenting
  • Plan and save your entire conference schedule
  • Explore a grid view of the program and your personal schedule
  • Locate events on a dynamic floorplan
  • Find key exhibitors, job fair companies, and product demonstrations
  • Request an alert when a proceedings paper publishes
  • Export a comprehensive trip report with your notes and meeting activity
  • Fill out and submit a session chair report.
  • Download the app now