Thank you for your interest in participating in SPIE Photomask Technology + EUV Lithography. We recommend reviewing the information below to become familiar with how to prepare your presentation.
| Abstracts due | 23 April 2026 |
| Registration opens | May 2026 |
| Authors notified and program posts online | 16 June 2026 |
| Student grant applications due | 20 June 2026 |
| Submission system opens for manuscripts and poster PDFs* | 7 July 2026 |
| Poster PDFs due for spie.org preview and publication | 13 August 2026 |
| Manuscripts due | 20 August 2026 |
| Advance upload deadline for oral presentation slides** | 5 September 2026 |
*Contact author or speaker must register prior to uploading
**After this date slides must be uploaded onsite at Speaker Check-In
