8 - 11 September 2026
Monterey, California, US

Information for Authors and Presenters

Information for authors, chairs, and committees: instructions, deadlines, and tips

We hope to see you in 2026

Find links to presenter instructions, important dates, and other information for a successful abstract submission and presentation at SPIE Photomask Technology + EUV Lithography.

Benefits of presenting and publishing your work with SPIE


Here's why publishing with SPIE puts a spotlight on your work:

  • The event will bring you international visibility
  • Your research becomes a part of the world's permanent scientific record
  • Your work will be indexed in all relevant scientific databases*

Make sure that your research gets timely publication in the SPIE Digital Library.

*SPIE partners with relevant scientific databases to ensure visibility for your research, including Astrophysical Data System (ADS), Ei Compendex, CrossRef, Google Scholar, Inspec, Scopus, and Web of Science Conference Proceedings Citation Index.

Important dates


Abstracts due 23 April 2026
Registration opens May 2026
Authors notified and program posts online 16 June 2026
Student grant applications due 20 June 2026
Submission system opens for manuscripts and poster PDFs* 7 July 2026
Poster PDFs due for spie.org preview and publication 13 August 2026
Manuscripts due 20 August 2026
Advance upload deadline for oral presentation slides** 5 September 2026

*Contact author or speaker must register prior to uploading

**After this date slides must be uploaded onsite at Speaker Check-In

Preparing for your participation