8 - 11 September 2026
Monterey, California, US

Photomask Technology + EUV Lithography Conferences

Important topics for photomask technology and EUVL

Technical conferences at SPIE Photomask Technology + EUV Lithography

SPIE offers the leading multidisciplinary meeting that is focused on global breakthroughs and challenges within photomask technology and EUVL. This event is where researchers and scientists gather to share latest advances across two conferences.

Two Conferences:

Photomask Technology

  • Design automation and data prep (DFM, OPC, SMO)
  • Mask write, corrections, process compensation (MPC)
  • Mask blanks, defects, and metrology (materials, process, control)
  • Mask process (resist, develop, etch, cleans)
  • Metrology (CD, placement, AFM, AIMS)
  • Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
  • Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
  • Nanoimprint lithography tools, mask, transfer, and resists
  • Deep learning mask technology applications

Extreme Ultraviolet Lithography

  • EUV readiness and insertion in manufacturing
  • EUV tools, including sources and optics
  • EUV mask metrology, inspection, and lifetime
  • EUV mask and imaging
  • EUV mask pellicles
  • EUV resist materials/process and contamination
  • EUV process control and stochastics
  • EUV patterning and process enhancement
  • EUV lithography extendibility

Registration includes 50 SPIE Digital Library downloads

Access the research you need

Presentations and manuscripts presented at Photomask Technology + EUV Lithography are published in the Proceedings of SPIE on the SPIE Digital Library.

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