Share your research and join the outstanding program for 2026
Make plans to join the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.
Submit an abstract and present your research in Monterey in September. The call for paper is now open.
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Be sure to plan ahead. If you will be traveling to the event from outside the US, we encourage you to start processing your paperwork early. Request an invitation letter and apply for a visa, if needed.
Watch the recording to gain an overview of the mask-making process, focusing on the metrology steps. Hans Stiepan from Carl Zeiss SMS explains critical mask parameters, with particular attention to advanced extreme ultraviolet (EUV) masks, and discusses their impact on the lithography process.
Sign in to or create a free SPIE account to view all past webinar recordings from the photomask and lithography community.
Attend the premier exhibition for mask makers, EUVL, emerging technologies, and mask business. Connect with top suppliers showcasing the newest products, innovations, and latest technologies.
Find ways to learn about the technology, the industry, and make important connections for your future. This event includes special awards, sessions, and grants for students — learn how to attend for free in 2026!
Award recipients from SPIE Photomask Technology + Extreme Ultraviolet Lithography gain the recognition they deserve. Celebrate the important work being done and further help the industry support student participation. View previous recipients; this year's recipients will be shared soon.