8 - 11 September 2026
Monterey, California, US

Photomask Technology + EUVL Exhibitors

Become an exhibitor and manage your exhibition experience
Three exhibitors stand in their booth, waiting to talk with attendees.

Reserve your 2026 space now

Exhibit your company at the premier technical meeting for mask makers, EUVL, emerging technologies, and mask business. Make sure you are represented among the top suppliers showcasing the newest products, innovations, and latest technologies.

Jump to: Exhibition audience stats

Venue

Monterey Conference Center
1 Portola Plaza
Monterey, CA 93940

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2026 Exhibition dates and times


Monterey Conference Center
Wednesday 9 September 2026 10:00 AM–4:00 PM
Thursday 10 September 2026 9:30 AM–4:00 PM

Join top companies showcasing these technologies


  • Mask technologies: inspection/repair, metrology, cleaning
  • Mask business
  • EUV lithography
  • Nanoimprint
  • Direct write
  • Patterning
  • Wafers
  • Tools
  • Simulation
  • Resists and substrates
  • Materials and etching

Photomask Technology + EUV Lithography 2026 rates


SPIE Corporate Member rates reflect a 15% discount.

Space type Non-Member  SPIE Corp Member 
6 ft. Table $3,350.00 $2,847.50
10 ft. x 10 ft. Booth* $5,850.00 $4,972.50

*Optional Corner $565 per corner (applies to booths only)

It’s a buyer-rich environment for the semiconductor industry


Connect with these focused professionals

  • Engineers and designers
  • Corporate managers
  • Application and product developers
  • Mask and chip designers
  • Resist chemists
  • Experts in mask infrastructure and mask integration
  • Standards developers
  • Attendees at Photomask Technology + EUV Lithography exhibition

    It's global

    More than 850 people from around the world attend SPIE Photomask Technology + EUV Lithography each year.*

    Map and percentages of attendance around the world

    It's good business

    Attendance by job functions: More than half of total attendance is made up of R&D, project development, and purchasing job titles.*

    Pie chart of attendance by job function

    *Based on historical data