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12 - 16 April 2026
Strasbourg, France
Conference 14093 > Paper 14093-20
Paper 14093-20

Femtosecond laser-generated stress waves in fused silica

13 April 2026 • 17:30 - 17:45 CEST | Curie A (Niveau/Level 1)

Abstract

Femtosecond lasers are key tools for 3D processing of transparent materials, but the stress waves they generate can degrade quality and induce cracking. We present a systematic study of stress-wave dynamics in fused silica using 1030-nm, 360-fs pulses with energies from 250 nJ to several μJ. Pump–probe microscope–polariscopy, combined with in situ intensity imaging and multiphysics simulations, enables high-resolution characterization of stress evolution. We find that stress-wave amplitude exhibits a logarithmic dependence on pulse energy, governed by peak-intensity clamping and consistent with simulations. These results establish a quantitative link between localized laser intensity and mechanical response, offering predictive insight for ultrafast laser processing.

Presenter

Lab. Lasers, Plasmas et Procédés Photoniques, CNRS (France), Aix-Marseille Univ. (France)
Alexandros Mouskeftaras is a CNRS researcher at the LP3 laboratory in Marseille, specializing in ultrafast laser–matter interaction and advanced laser processing. He earned his PhD in Physics from École Polytechnique in 2013 and previously worked as a laser process engineer in the R&D division of The Swatch Group in Switzerland. Combining a strong interest in both fundamental physics and applied technologies, he develops advanced diagnostics to investigate ultrashort laser pulse interactions with matter—ranging from transparent solids to heterogeneous media—and designs innovative laser beam delivery strategies to enable next-generation laser processing techniques.
Presenter/Author
Lab. Lasers, Plasmas et Procédés Photoniques, CNRS (France), Aix-Marseille Univ. (France)
Author
CEA-Cesta (France)
Author
Olivier Utéza
Lab. Lasers, Plasmas et Procédés Photoniques, CNRS (France), Aix-Marseille Univ. (France)
Author
Olga Koritsoglou
Lab. Lasers, Plasmas et Procédés Photoniques, CNRS (France), Aix-Marseille Univ. (France)