Paper 14100-59
Edge coupling of a thin film lithium niobate device using a double-layer metasurface attached to an optical fiber
14 April 2026 • 18:10 - 20:00 CEST | Galerie Erasme (Niveau/Level 0)
Abstract
To address the persistent challenges of mode mismatch and alignment sensitivity in thin film lithium niobate (TFLN) photonic integration, a novel fiber-to-chip edge coupling method based on an all-dielectric double-layer metasurface (DLMS) is proposed and theoretically investigated. The DLMS structure, inspired by the optical functionality of two orthogonal cylindrical lenses, is designed to reshape a Gaussian beam emitted from an optical fiber into an elliptical profile closely matched to the guided mode of rib-type TFLN waveguides. A coupling loss (CL) below 1.9 dB/facet across the full telecommunication band (1460–1630 nm) is achieved, with a minimum CL of 0.6 dB/facet at 1550 nm.
Presenter
Electronics and Telecommunications Research Institute (Korea, Republic of)
I received the B.S. degrees from the Incheon National University, Incheon, Korea, in 1996, and the M.S. degree in Physics from the Korea University, Seoul, Korea, in 1998, and the Ph.D. degree in electrical engineering from the KAIST, Daejeon, Korea, in 2010. I joined the Electronics and Telecommunications Research Institute (ETRI), Daejeon, Korea, in 2000, and currently a Principal Research Scientist and also a professor in the Quantum Information Department, University of Science and Technology, Daejeon. I have investigated on micro- and nano-scale photonic devices using polymer, silicon, two-dimensional materials. Recently, my research has focused on developing metasurface–AI integrated biosensors, Metasurface-based devices and communication systems, and thin-film lithium niobate photonic quantum device and technologies.